Measurement error revisited

Research output: Contribution to journalConference articlepeer-review

Original languageEnglish
Pages (from-to)703-727
Number of pages25
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3873 (I
StatePublished - 1999
Externally publishedYes
Event19th Annual BACUS Symposium on Photomask Technology - Monterey, CA, USA
Duration: Sep 15 1999Sep 17 1999

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this