MoSi PSM defect inspection and sensitivity analysis

Jerry X. Chen, Robert K. Henderson, Franklin Kalk

Research output: Contribution to journal › Conference article › peer-review

Original language	English
Pages (from-to)	121-131
Number of pages	11
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3546
DOIs	https://doi.org/10.1117/12.332816
State	Published - 1998
Externally published	Yes
Event	Proceedings of the 1998 18th Annual Symposium on Photomask Technology and Management - Redwood City, CA, USA Duration: Sep 16 1998 → Sep 18 1998

ASJC Scopus Subject Areas

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author = "Chen, {Jerry X.} and Henderson, {Robert K.} and Franklin Kalk",

year = "1998",

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pages = "121--131",

note = "Proceedings of the 1998 18th Annual Symposium on Photomask Technology and Management ; Conference date: 16-09-1998 Through 18-09-1998",

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AU - Henderson, Robert K.

AU - Kalk, Franklin

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JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Proceedings of the 1998 18th Annual Symposium on Photomask Technology and Management

Y2 - 16 September 1998 through 18 September 1998

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