MoSi PSM defect inspection and sensitivity analysis

Jerry X. Chen, Robert K. Henderson, Franklin Kalk

Research output: Contribution to journalConference articlepeer-review

Original languageEnglish
Pages (from-to)121-131
Number of pages11
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 1998
Externally publishedYes
EventProceedings of the 1998 18th Annual Symposium on Photomask Technology and Management - Redwood City, CA, USA
Duration: Sep 16 1998Sep 18 1998

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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